United States

This work presents the analysis of spike, burst, and network burst activity in a microfluidic brain-on-chip. A collection of activities in the electrophysiological recordings, measured by multielectrode arrays, provided strong clues for the maintenance of human induced pluripotent stem cells-derived cortical neuron cultures in 3D for 37 days.

EIPBN 2021

Detection of network burst activity in a MEMS-based 3D neuronal cell culture system

multielectrode array

microbioreactor

3d neuronal cell culture

### Looking for Cogsci 2023? Please [click here](https://underline.io/events/405/reception) to switch to 2023 edition.


**Dear Colleagues,**

Welcome to the 43rd Annual Conference of the Cognitive Science Society! 

This year’s conference brings together the latest research from all Cognitive Science and also highlights this year’s theme **Comparative Cognition: Animal Minds.** 

The program features four plenary speakers: Friederike Range (University of Veterinary Medicine, Vienna), Onur Güntürkün (Ruhr University Bochum), Julia Fischer (University of Göttingen), and Erich Jarvis (The Rockefeller University). The keynotes and invited symposia showcase the broad spectrum of ideas that encompass the conference theme of comparative cognition. 

Further, the program includes the Rumelhart Prize keynote presentation by Susan Goldin-Meadow (University of Chicago), and symposia to celebrate the winner of the Elman Prize: Wei Ji Ma (New York University), the Heineken Award winner Robert Zatorre (McGill University), and the Robert J. Glushko Dissertation Prizes session.

The program committee for CogSci 2021 received 1,025 submissions, including 710 full papers, 275 member abstracts, 8 publication-based talks, as well as 15 proposals for symposia, and 17 for workshops and tutorials. After a rigorous review process, the committee selected 152 papers for oral presentation and inclusion in the conference proceedings (14.8%), 332 papers for poster presentation and inclusion in the proceedings (32.4%), and 175 papers for poster presentation with inclusion of abstracts in the proceedings (17.1%) We also selected 275 submitted member abstracts. In addition, we accepted 6 publication-based talks, 12 symposia, and 9 workshops and tutorials to make for an exciting and inclusive program.

We hope that you enjoy the conference this year!<br><br>

**Your Program Chairs,**
![](https://assets.underline.io/uploads/markdown_image/1/image/99984908caba5e6453e5fc5ba34f3507.jpg)

**Learn more about the Vienna Cognitive Science Hub at the University of Vienna, hosts of CogSci 2021**

<iframe width="560" height="315" src="https://www.youtube.com/embed/464h1m3iU68" title="YouTube video player" frameborder="0" allow="accelerometer; autoplay; clipboard-write; encrypted-media; gyroscope; picture-in-picture" allowfullscreen></iframe>

To review the proceedings for the conference or review the searchable program, please visit the [website](https://cognitivesciencesociety.org/program/).


CogSci 2021

The Cognitive Science Society brings together researchers from around the world who hold a common goal: understanding the nature of the human mind. The mission of the Society is to promote Cognitive Science as a discipline, and to foster scientific interchange among researchers in various areas of study, including Artificial Intelligence, Linguistics, Anthropology, Psychology, Neuroscience, Philosophy, and Education. The Society is a non-profit professional organization and its activities include sponsoring an annual conference and publishing the journals Cognitive Science and TopiCS.

poster

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
<br>
<br>
<br>
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)
<br>
<br>
<br>
<br>


To register for this event, please follow the link below.

New resists are required to advance the nanoelectronics industry to keep up the demands of Moore’s law. A new class of high dry etch selectively electron beam resist materials have been developed that are based on a family of heterometallic rings.

Improving the Sensitivity of Metallic Organic Resists

Maskless Grayscale lithography is a key technology to create structured surfaces in photoresist, especially for micro-optic applications. Processes of low-contrast positive resist are well known and used for thicknesses up to 60 µm. The possibility to fabricate higher structures, i.e. 80 µm, 100 µm high and beyond, are of great interest in the micro-optic world. With some double- and triple-coated layers of an experimental resist, we could make structures 83µm and 100µm tall. The triple- coated layer showed some limitations that we plan to overcome to go beyond 100µm.

Improvements on Maskless Grayscale Lithography in thick positive photoresist

In this work, we present a systematic investigation of plasma etching of Cr2O3 films via an inductively coupled plasma-reactive ion etching system in nanoscale. The effects of plasma composition, rf-chuck power and ICP source power on the etch rates, sidewall profile, surface roughness, selectivity and dc-bias have been systematically investigated.

Patterning of Chromium Oxide (Cr2O3) as a Hard Mask by Plasma Etching

We characterize in-situ the impact of aberration-corrected electron-beam lithography (AC-EBL) on the performance of suspended graphene field-effect transistors. When AC-EBL is performed on the vicinity of a graphene channel, detrimental effects can be removed by vigorous annealing, while the damage caused by AC-EBL performed directly on a channel is irreversible.

In-situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices

Massively-parallel electron-beam systems are developed to improve the writing throughput.  Two different methods to further decrease the writing time are investigated, i.e., reducing the maximum dose difference in a feature and utilizing empty cycles (with no beam on) in the conventional writing methods.

Reduction of Exposing Time in Massively-Parallel E-beam Systems

A modular, UHV sealed FEG operational betwee 30-100 keV has been developed. This design lends itself to integration onto thermionically operated TEMs, EBL into FEG operation or in R & D applications. Graphitic carbon and gold particles have been resolved confirming a resolution of better than 0.24nm at 60-100 keV.

A modular 100 keV vacuum sealed FEG

In this contribution, the generation of multiple electron-beam from an InGaN photocathode was demonstrated. 25 electron beams were observed by irradiating 25 lasers. The averaged diameter was 0.6 mm with a gaussian distribution. The deviation in diameter was 17%.

Multiple Electron-Beam Generation from InGaN Photocathode

For direct writing laser lithography, GenISys BEAMER and LAB software allows for correcting proximity effects and to achieve fast approximation of a desired shape without tedious iterations. We show the importance of parameters such as vertical focus variation on staircase structures and lens-like shapes using a Heidelberg Instruments DWL 66+.

Bend the curve: the benefit of optical proximity correction in direct writing lithography simulation and experiment

After irradiating the electron beam, we measured the surface potential with an electrostatic force microscope (EFM).
In the presentation, we will explain the measurement results using the model we devised.

Investigation of Non-Charging Exposure Conditions for Insulating Resist Films in Electron Beam Lithography

We investigate the surface wetting properties for a range of micro/nanofabricated topography on aluminium surfaces supported by ion-beam processing to enhance liquid-solid interaction.

Downloads

Next from EIPBN 2021

Improving the Sensitivity of Metallic Organic Resists

Similar lecture

Are Convolutional Neural Networks or Transformers more like human vision?