EIPBN 2021

June 02, 2021

United States

Would you like to see your presentation here, made available to a global audience of researchers?
Add your own presentation or have us affordably record your next conference.

Please log in to leave a comment

Downloads

SlidesTranscript English (automatic)

Next from EIPBN 2021

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask
poster

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask

EIPBN 2021

I-Te ChenYi-An Chen
Chih-Hao Chang and 2 other authors

01 June 2021

Similar lecture

Focused Ion Beam Patterning for Defect-Mediated Nucleation on 2D van der Waals Materials
technical paper

Focused Ion Beam Patterning for Defect-Mediated Nucleation on 2D van der Waals Materials

EIPBN 2021

Vera Zarubin
Vera Zarubin

02 June 2021